Dr. Sook Lee
at ASML
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2019 Presentation + Paper
Ao Chen, Kar Kit Koh, Yee Mei Foong, Bradley Morgenfeld, Jun Chen, Sandra Lee, Xi Chen, Hesham Omar, Mu Feng, ChangAn Wang, Keith Gronlund, Jun Lang, James Guerrero, Yiqiong Zhao
Proceedings Volume 10961, 109610F (2019) https://doi.org/10.1117/12.2514784
KEYWORDS: Diffusion, SRAF, Photoresist processing, Calibration, Photo decomposable quencher, Semiconducting wafers, Process modeling, Performance modeling, 3D modeling, Error analysis

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10143, 101431E (2017) https://doi.org/10.1117/12.2260441
KEYWORDS: Optical proximity correction, Metals, Oxides, Back end of line, Extreme ultraviolet, Photomasks, Etching, Resistance, Photoresist materials, Extreme ultraviolet lithography, Calibration, Data modeling, Semiconducting wafers, Metrology, Finite element methods

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