Ms. Sayaka Tamaoki Profile

Sayaka Tamaoki

at Toshiba Corp.

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 12 April 2013 Paper

Source and mask optimization to mitigate hotspots in etch process

Yuko Kono, Yasunobu Kai, Kazuyuki Masukawa, Sayaka Tamaoki, Takaki Hashimoto, Taiki Kimura, Ryota Aburada, Toshiya Kotani

Proceedings Volume 8683, 86830N (2013) https://doi.org/10.1117/12.2011648

KEYWORDS: Source mask optimization, Lithography, Etching, Photomasks, 3D image processing, Photoresist processing, Semiconducting wafers, Reactive ion etching, 3D modeling, Nanoimprint lithography

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years