Dr. Saurabh Agarwal Profile

Dr. Saurabh Agarwal

at Intel Corp

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Publications (1)

Proceedings Article | 15 March 2012 Paper

Mesoscale simulation of the line-edge structure during positive and negative tone resist development process

Hiroshi Morita, Ichiro Okabe, Saurabh Agarwal, Vivek Singh

Proceedings Volume 8325, 83250J (2012) https://doi.org/10.1117/12.916389

KEYWORDS: Polymers, Line edge roughness, Particles, Photoresist materials, Photoresist processing, Calibration, Photoresist developing, Polymer thin films, Molecules, Lithography

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