Dr. Hiroshi Morita Profile

Dr. Hiroshi Morita

Senior Researcher at AIST

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Author

Publications (7)

Proceedings Article | 20 March 2015 Paper

Analysis of the self-assembling and the defect annihilation processes in DSA using meso-scale simulation

Hiroshi Morita, Yuki Norizoe

Proceedings Volume 9425, 942510 (2015) https://doi.org/10.1117/12.2085650

KEYWORDS: Particles, Polymers, Monte Carlo methods, Lithography, Optical lithography, Analytical research, Interfaces, Directed self assembly, Fabrication, Materials processing

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Proceedings Article | 28 March 2014 Paper

Development of fast DSA simulation method using OCTA system

Hiroshi Morita

Proceedings Volume 9049, 90492O (2014) https://doi.org/10.1117/12.2046090

KEYWORDS: Monte Carlo methods, Particles, Polymers, Polymer thin films, Lithography, Computer simulations, Optical lithography, Interfaces, Nanotechnology, Directed self assembly

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Proceedings Article | 15 March 2012 Paper

Mesoscale simulation of the line-edge structure during positive and negative tone resist development process

Hiroshi Morita, Ichiro Okabe, Saurabh Agarwal, Vivek Singh

Proceedings Volume 8325, 83250J (2012) https://doi.org/10.1117/12.916389

KEYWORDS: Polymers, Line edge roughness, Particles, Photoresist materials, Photoresist processing, Calibration, Photoresist developing, Polymer thin films, Molecules, Lithography

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Proceedings Article | 16 April 2011 Paper

Meso-scale simulation of the line-edge structure based on resist polymer molecules by negative-tone process

Hiroshi Morita

Proceedings Volume 7972, 79720W (2011) https://doi.org/10.1117/12.879587

KEYWORDS: Polymers, Particles, Monte Carlo methods, Line edge roughness, Interfaces, Computer simulations, Photoresist processing, Edge roughness, Molecules, Liquids

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SPIE Journal Paper | 1 October 2010

Mesoscale simulation of line-edge structures based on polymer chains in development and rinse processes

Hiroshi Morita, Masao Doi

JM3, Vol. 9, Issue 04, 041213, (October 2010) https://doi.org/10.1117/12.10.1117/1.3530593

KEYWORDS: Polymers, Particles, Liquids, Picosecond phenomena, Line edge roughness, Polymer thin films, Photoresist processing, Interfaces, Lithography, Computer simulations

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Proceedings Article | 26 March 2010 Paper

Meso-scale simulation of the line-edge structure based on polymer chains in the developing and rinse process

Hiroshi Morita, Masao Doi

Proceedings Volume 7639, 763932 (2010) https://doi.org/10.1117/12.846526

KEYWORDS: Polymers, Particles, Liquids, Line edge roughness, Edge roughness, Polymer thin films, Interfaces, Lithography, Photoresist processing, Diffusion

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Proceedings Article | 1 April 2009 Paper

Meso-scale simulation of the polymer dynamics in the formation process of line-edge roughness

Hiroshi Morita, Masao Doi

Proceedings Volume 7273, 727337 (2009) https://doi.org/10.1117/12.814017

KEYWORDS: Polymers, Particles, Line edge roughness, Interfaces, Polymer thin films, Lithography, Process modeling, Edge roughness, Extreme ultraviolet, Photoresist processing

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Showing 5 of 7 publications

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