Peter J. Fiekowsky
President at AVI-Photomask
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 21 April 2016 Paper
Raunak Mann, Eliot Goodman, Keith Lao, Steven Ha, Anthony Vacca, Peter Fiekowsky, Dan Fiekowsky
Proceedings Volume 9778, 97783U (2016) https://doi.org/10.1117/12.2230847
KEYWORDS: Reticles, Semiconducting wafers, Inspection, Photomasks, Scanners, Lithography, Optical proximity correction, Feature extraction, Databases, Critical dimension metrology, Defect inspection

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 96351W (2015) https://doi.org/10.1117/12.2197814
KEYWORDS: Photomasks, Inspection, Critical dimension metrology, Opacity, Lithography, Semiconducting wafers, Source mask optimization, Reticles, Optical proximity correction, Bridges

Proceedings Article | 20 October 2014 Paper
Shazad Paracha, Eliot Goodman, Benjamin Eynon, Ben Noyes, Steven Ha, Jong-Min Kim, Dong-Seok Lee, Dong-Heok Lee, Sang-Soo Cho, Young Ham, Anthony Vacca, Peter Fiekowsky, Daniel Fiekowsky
Proceedings Volume 9235, 92350Q (2014) https://doi.org/10.1117/12.2070256
KEYWORDS: Inspection, Reticles, Semiconducting wafers, Photomasks, Bridges, Modulation, Lithography, Scanning electron microscopy, Classification systems, Polarization

Proceedings Article | 2 April 2014 Paper
Shazad Paracha, Benjamin Eynon, Ben Noyes, Anthony Nhiev, Anthony Vacca, Peter Fiekowsky, Dan Fiekowsky, Young Mog Ham, Doug Uzzel, Michael Green, Susan MacDonald, John Morgan
Proceedings Volume 9050, 905031 (2014) https://doi.org/10.1117/12.2048622
KEYWORDS: Reticles, Semiconducting wafers, Inspection, Photomasks, Classification systems, Scanning electron microscopy, Critical dimension metrology, Error analysis, Wafer testing, Defect detection

Proceedings Article | 1 October 2013 Paper
Sung Jae Ryu, Sung Taek Lim, Anthony Vacca, Peter Fiekowsky, Dan Fiekowsky
Proceedings Volume 8880, 88800D (2013) https://doi.org/10.1117/12.2028275
KEYWORDS: Inspection, Reticles, Semiconducting wafers, Photomasks, Contamination, Lithography, Defect inspection, Inspection equipment, Scanners, Yield improvement

Showing 5 of 19 publications
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