Mr. Nobuyuki Irie Profile

Nobuyuki Irie

at Nikon Corp

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Author

Publications (9)

Proceedings Article | 12 May 2005 Paper

Progressive ArF exposure tool for 65nm node lithography

Nobuyuki Irie, Masato Hamatani, Masahiro Nei

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599564

KEYWORDS: Semiconducting wafers, Scanners, Lithography, Lithographic illumination, Reticles, Atrial fibrillation, Imaging systems, Polarization, Optical alignment, Distortion

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Proceedings Article | 28 August 2003 Paper

Photomask repeater strategy for high-quality and low-cost reticle fabrication

Suigen Kyoh, Soichi Inoue, Osamu Ikenaga, Tomotaka Higaki, Fumiaki Shigemitsu, Ichiro Mori, Haruo Kokubo, Naoya Hayashi, Nobuyuki Irie, Yuki Ishii, Toshikazu Umatate

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504178

KEYWORDS: Photomasks, Reticles, Mask making, Deep ultraviolet, Optical lithography, Semiconductors, Printing, Manufacturing, Lithography, Critical dimension metrology

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Proceedings Article | 5 September 2001 Paper

Improvement of photomask repeater for 130-nm lithography

Suigen Kyoh, Soichi Inoue, Ichiro Mori, Nobuyuki Irie, Yuuki Ishii, Toshikazu Umatate, Haruo Kokubo, Naoya Hayashi

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438376

KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Error analysis, Semiconducting wafers, Metals, Optical proximity correction, Printing, Inspection, Measurement devices

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Proceedings Article | 22 January 2001 Paper

Management of pattern generation system based on i-line stepper

Suigen Kyoh, Satoshi Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410728

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Semiconducting wafers, Opacity, Optical proximity correction, Optical lithography, Error analysis, Inspection, Chromium

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Proceedings Article | 22 January 2001 Paper

New concept photomask repeater with stitching exposure technique

Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate, Suigen Kyoh, Shun-Ichiro Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410713

KEYWORDS: Reticles, Photomasks, Manufacturing, Critical dimension metrology, System on a chip, Optical lithography, Terbium, Optical alignment, Semiconducting wafers, Optical proximity correction

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Proceedings Article | 19 July 2000 Paper

New photomask pattern generation method based on i-line stepper

Suigen Kyoh, Shun-Ichiro Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392096

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Critical dimension metrology, System on a chip, Lithography, Printing, Kinematics, Scanning electron microscopy, Process engineering

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Proceedings Article | 19 July 2000 Paper

New-concept i-line stepper for mask fabrication

Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate, Suigen Kyoh, Satoshi Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392077

KEYWORDS: Reticles, Photomasks, Critical dimension metrology, Manufacturing, System on a chip, Optical proximity correction, Mask making, Semiconducting wafers, Digital signal processing, Fabrication

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Proceedings Article | 5 July 2000 Paper

New pattern generation system based on i-line stepper: photomask repeater

Suigen Kyoh, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Nobutaka Magome

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389056

KEYWORDS: Photomasks, Critical dimension metrology, System on a chip, Semiconducting wafers, Lithography, Kinematics, Optical lithography, Printing, Optical components, Optical filters

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Proceedings Article | 26 May 1995 Paper

Automatic laser-scanning focus detection method using printed focus pattern

Kyoichi Suwa, Hiroki Tateno, Nobuyuki Irie, Shigeru Hirukawa

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209298

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Photoresist materials, Monochromatic aberrations, Reticles, Sensors, Laser vision correction, Optical testing, Time metrology, Silicon

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Showing 5 of 9 publications

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