Automatic laser-scanning focus detection method using printed focus pattern

Kyoichi Suwa; Hiroki Tateno; Nobuyuki Irie; Shigeru Hirukawa

doi:10.1117/12.209298

26 May 1995 Automatic laser-scanning focus detection method using printed focus pattern

Kyoichi Suwa, Hiroki Tateno, Nobuyuki Irie, Shigeru Hirukawa

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209298
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

An innovative method of determining best focus with an optical exposure tool has been developed. The method uses wedge shaped marks in photoresist that can be measured automatically. The results show that best focus can be measured with a repeatability of 20 nm. The automatic focus measurement system can be used to characterize lens astigmatism, field curvature and tilt. Data shows good correlation with conventional methods using SEM linewidth measurement.

Citation Download Citation

Kyoichi Suwa, Hiroki Tateno, Nobuyuki Irie, and Shigeru Hirukawa "Automatic laser-scanning focus detection method using printed focus pattern", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209298

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