Latent image metrology for production wafer steppers

Peter Dirksen; Walter de Laat; Henry J. L. Megens

doi:10.1117/12.209297

26 May 1995 Latent image metrology for production wafer steppers

Peter Dirksen, Walter de Laat, Henry J. L. Megens

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209297
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

A new latent image metrology technique is discussed that determines best focus with a precision of (sigma) equals 20 nm. This technique uses the existing alignment system of an ASM-L wafer stepper and requires no hardware or software modifications. The user just needs a standard chrome reticle. It can operate for machine setup at the factory, but also in-process for fully automatic self calibration of focus and tilt. A typical measurement takes a few minutes.

Citation Download Citation

Peter Dirksen, Walter de Laat, and Henry J. L. Megens "Latent image metrology for production wafer steppers", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209297

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