Dr. Michiel V. P. Kruger
Graduate Student
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72740B (2009) https://doi.org/10.1117/12.814215
KEYWORDS: Diffractive optical elements, Photomasks, Manufacturing, Nanoimprint lithography, Source mask optimization, SRAF, Lithographic illumination, Model-based design, Image processing, Lithium

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