Dr. Bayram Yenikaya Profile

Dr. Bayram Yenikaya

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Publications (13)

Proceedings Article | 24 March 2017 Paper

Advanced application of pattern-aware OPC

James Chen, Shin-Shing Yeh, Alan Zhu, Bayram Yenikaya, Fan-Hsuan Hsu, Yung-Ching Mai, Lawrence Lin, Nelson Lai

Proceedings Volume 10147, 101471W (2017) https://doi.org/10.1117/12.2258331

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Model-based design, SRAF, Lithography, Process control, Computational lithography, Pattern recognition, Yield improvement, 193nm lithography, Optical lithography

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Proceedings Article | 24 March 2017 Presentation + Paper

Full chip hierarchical inverse lithography: a solution with perfect symmetry

Bayram Yenikaya

Proceedings Volume 10147, 101470L (2017) https://doi.org/10.1117/12.2257608

KEYWORDS: Lithography, Computational lithography, Manufacturing, SRAF, Inspection, Lithographic illumination, Optical proximity correction, Databases, Tolerancing, Algorithm development, Photoresist materials

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Proceedings Article | 31 March 2014 Paper

Study of the pattern aware OPC

Shin-Shing Yeh, Alan Zhu, James Chen, Bayram Yenikaya, Yi-Shiang Chang, Chia-Chi Lin

Proceedings Volume 9052, 90521Y (2014) https://doi.org/10.1117/12.2046059

KEYWORDS: Optical proximity correction, Nanoimprint lithography, Resolution enhancement technologies, Control systems, Logic devices, Sensors, Lithography, Image quality, Metals, Process control

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Proceedings Article | 31 March 2014 Paper

Fixing the focus shift caused by 3D mask diffraction

Bayram Yenikaya, Constantin Chuyeshov, Onur Bakir, Youngae Han

Proceedings Volume 9052, 905217 (2014) https://doi.org/10.1117/12.2045682

KEYWORDS: Photomasks, Optical proximity correction, 3D modeling, SRAF, Diffraction, Data modeling, Semiconducting wafers, Calibration, Chlorine, Optical lithography

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Proceedings Article | 23 September 2009 Paper

Model-based assist features

Bayram Yenikaya, Oleg Alexandrov, Yongjun Kwon, Anwei Liu, Ali Mokhberi, Apo Sezginer

Proceedings Volume 7488, 748815 (2009) https://doi.org/10.1117/12.829938

KEYWORDS: SRAF, Photomasks, Model-based design, Optimization (mathematics), Printing, Semiconducting wafers, Systems modeling, Resolution enhancement technologies, Optical proximity correction, Alternate lighting of surfaces

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Proceedings Article | 11 May 2009 Paper

Model-based assist features

Bayram Yenikaya, Oleg Alexandrov, Steven Chen, Anwei Liu, Ali Mokhberi, Apo Sezginer

Proceedings Volume 7379, 73792Z (2009) https://doi.org/10.1117/12.824350

KEYWORDS: SRAF, Photomasks, Model-based design, Lithography, Printing, Optimization (mathematics), Electroluminescence, Critical dimension metrology, Lithographic illumination, Systems modeling

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Proceedings Article | 16 March 2009 Paper

Enabling process window improvement at 45nm and 32nm with free-form DOE illumination

Tamer Coskun, Apo Sezginer, Vishnu Kamat, Michiel Kruger, Bayram Yenikaya, James Carriere, Jared Stack, Marc Himel

Proceedings Volume 7274, 72740B (2009) https://doi.org/10.1117/12.814215

KEYWORDS: Diffractive optical elements, Photomasks, Manufacturing, Nanoimprint lithography, Source mask optimization, SRAF, Lithographic illumination, Model-based design, Image processing, Lithium

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Proceedings Article | 15 May 2007 Paper

Double patterning technology: process-window analysis in a many-dimensional space

Apo Sezginer, Bayram Yenikaya, Wolfgang Staud

Proceedings Volume 6607, 66072S (2007) https://doi.org/10.1117/12.729011

KEYWORDS: Etching, Double patterning technology, Lithography, Optical lithography, Error analysis, Image processing, Statistical analysis, Visualization, Image registration, Modulation transfer functions

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Proceedings Article | 21 March 2007 Paper

A rigorous method to determine printability of a target layout

Bayram Yenikaya, Apo Sezginer

Proceedings Volume 6521, 652112 (2007) https://doi.org/10.1117/12.711530

KEYWORDS: Modulation transfer functions, Lithography, Tolerancing, Photomasks, Optical proximity correction, Spatial frequencies, Modulation, Resolution enhancement technologies, Photoresist materials, Semiconducting wafers

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Proceedings Article | 21 March 2007 Paper

Double patterning technology: process-window analysis in a many-dimensional space

Apo Sezginer, Bayram Yenikaya

Proceedings Volume 6521, 652113 (2007) https://doi.org/10.1117/12.711515

KEYWORDS: Etching, Lithography, Double patterning technology, Error analysis, Optical lithography, Image processing, Statistical analysis, Visualization, Image registration, Modulation transfer functions

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Proceedings Article | 20 March 2007 Paper

Model-based assist feature generation

Bayram Yenikaya, Apo Sezginer

Proceedings Volume 6521, 652102 (2007) https://doi.org/10.1117/12.711504

KEYWORDS: Photomasks, SRAF, Optical proximity correction, Tolerancing, Lithography, Model-based design, Photoresist materials, Algorithm development, Image processing, Lithographic illumination

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Proceedings Article | 14 March 2006 Paper

Optimal segmentation of polygon edges

Apo Sezginer, Bayram Yenikaya, Hsu-Ting Huang, Vishnu Kamat, Yung-Tin Chen

Proceedings Volume 6156, 61561G (2006) https://doi.org/10.1117/12.656695

KEYWORDS: Image segmentation, Photomasks, Image processing algorithms and systems, Optical proximity correction, Optimization (mathematics), Tolerancing, Data modeling, Detection and tracking algorithms, Manufacturing, Semiconducting wafers

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Proceedings Article | 13 March 2006 Paper

Sequential PPC and process-window-aware mask layout synthesis

Apo Sezginer, Franz Zach, Bayram Yenikaya, Jesus Carrero, Hsu-Ting Huang

Proceedings Volume 6156, 615613 (2006) https://doi.org/10.1117/12.656667

KEYWORDS: Etching, Photomasks, Process modeling, Model-based design, Lithography, Data modeling, Photoresist processing, Tolerancing, Image processing, Semiconducting wafers

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Showing 5 of 13 publications

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