Dr. Kikuo Furukawa Profile

Dr. Kikuo Furukawa

at Mitsubishi Gas Chemical Co Inc

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Author

Publications (6)

Proceedings Article | 20 March 2015 Paper

Evaluation of novel lactone derivatives for chemically amplified EUV resists

Hiroyasu Tanaka, Tetsuhiko Mizusaka, Hiroyuki Tanagi, Kikuo Furukawa, Hiroki Yamamoto, Takahiro Kozawa

Proceedings Volume 9425, 94251R (2015) https://doi.org/10.1117/12.2083755

KEYWORDS: Extreme ultraviolet lithography, Polymers, Line edge roughness, Extreme ultraviolet, Lithography, Photoresist materials, Optical lithography, Diffusion, Statistical modeling, Photopolymers

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Proceedings Article | 27 March 2014 Paper

Evaluation of novel hydrophilic derivatives for chemically amplified EUV resists

Hiroyuki Tanagi, Hiroyasu Tanaka, Shoichi Hayakawa, Kikuo Furukawa, Hiroki Yamamoto, Takahiro Kozawa

Proceedings Volume 9051, 905125 (2014) https://doi.org/10.1117/12.2045892

KEYWORDS: Polymers, Extreme ultraviolet lithography, Line edge roughness, Extreme ultraviolet, Lithography, Diffusion, Scanning electron microscopy, Resolution enhancement technologies, Polymethylmethacrylate, Optical lithography

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Proceedings Article | 27 March 2014 Paper

Development of novel protecting derivatives for chemically amplified extreme ultraviolet resist

Hiroyasu Tanaka, Hiroyuki Tanagi, Shoichi Hayakawa, Kikuo Furukawa, Hiroki Yamamoto, Takahiro Kozawa

Proceedings Volume 9051, 905127 (2014) https://doi.org/10.1117/12.2045887

KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Lithography, Line edge roughness, Optical lithography, Photoresist developing, Scanning electron microscopy, Photoresist materials, Photoresist processing

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Proceedings Article | 30 March 2010 Paper

Evaluation of hydroxyl derivatives for chemically amplified extreme ultraviolet resist

Kikuo Furukawa, Yoshihisa Arai, Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 7639, 76391L (2010) https://doi.org/10.1117/12.846460

KEYWORDS: Extreme ultraviolet lithography, Polymers, Extreme ultraviolet, Quantum efficiency, Diffusion, Lithography, Photopolymers, Line edge roughness, Photoresist materials, Absorption

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Proceedings Article | 1 April 2009 Paper

Evaluation of alcoholic hydroxyl derivatives for chemically amplified extreme ultraviolet resist

Kikuo Furukawa, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 7273, 72731Y (2009) https://doi.org/10.1117/12.814005

KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Lithography, Diffusion, Photopolymers, Oxygen, Statistical modeling, Electrons, Polymethylmethacrylate

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Proceedings Article | 26 March 2008 Paper

Evaluation of adamantane derivatives for chemically amplified resist: a comparison between ArF, EUV, and EB exposures

Kikuo Furukawa, Shu Seki, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 6923, 692334 (2008) https://doi.org/10.1117/12.772408

KEYWORDS: Extreme ultraviolet lithography, Polymers, Lithography, Extreme ultraviolet, Line edge roughness, Photoresist materials, Scanning electron microscopy, Optical lithography, Chemically amplified resists, Immersion lithography

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Showing 5 of 6 publications

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