Evaluation of adamantane derivatives for chemically amplified resist: a comparison between ArF, EUV, and EB exposures

Kikuo Furukawa; Shu Seki; Takahiro Kozawa; Seiichi Tagawa

doi:10.1117/12.772408

26 March 2008 Evaluation of adamantane derivatives for chemically amplified resist: a comparison between ArF, EUV, and EB exposures

Kikuo Furukawa, Shu Seki, Takahiro Kozawa, Seiichi Tagawa

Author Affiliations +

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 692334 (2008) https://doi.org/10.1117/12.772408
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Photoresists containing adamantane derivatives have been widely used with ArF exposure tools. However, the performance characteristics of adamantane derivatives with other optical sources, such as extreme ultraviolet (EUV) and electron beam (EB) sources, have not been well-studied. To clarify such performance characteristics for several exposure sources, we synthesized acrylic terpolymers containing adamantyl methacrylates as model photopolymers and exposed the resist samples based on these polymers to ArF, EUV and EB radiations. On the basis of the lithographic performance characteristics of these resist samples, we evaluated the performance characteristics of adamantane derivatives upon exposure to different radiations. We discuss the relationship between the chemical structures of adamantane derivatives and lithographic performance characteristics.

Citation Download Citation

Kikuo Furukawa, Shu Seki, Takahiro Kozawa, and Seiichi Tagawa "Evaluation of adamantane derivatives for chemically amplified resist: a comparison between ArF, EUV, and EB exposures", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 692334 (26 March 2008); https://doi.org/10.1117/12.772408

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