Dr. John E. Goldsmith
Manager of Nanolithography Dept at Sandia National Labs California
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 16 June 2003 Paper
Donna O'Connell, Sang Hun Lee, William Ballard, Daniel Tichenor, Louis Bernardez, Steven Haney, Terry Johnson, Pamela Barr, Alvin Leung, Karen Jefferson, William Replogle, John Goldsmith, Henry Chapman, Patrick Naulleau, Stefan Wurm, Eric Panning
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484967
KEYWORDS: Projection systems, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Line edge roughness, Reticles, Wavefronts

Proceedings Article | 1 July 2002 Paper
Daniel Tichenor, William Replogle, Sang Hun Lee, William Ballard, Alvin Leung, Glenn Kubiak, Leonard Klebanoff, Samual Graham, John Goldsmith, Karen Jefferson, John Wronosky, Tony Smith, Terry Johnson, Harry Shields, Layton Hale, Henry Chapman, John Taylor, Donald Sweeney, James Folta, Gary Sommargren, Kenneth Goldberg, Patrick Naulleau, David Attwood, Eric Gullikson
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472328
KEYWORDS: Semiconducting wafers, Sensors, Extreme ultraviolet, Reticles, Projection systems, Extreme ultraviolet lithography, Printing, Lithography, Fiber optic illuminators, Wavefronts

Proceedings Article | 1 July 2002 Paper
Sang Hun Lee, Daniel Tichenor, William Ballard, Luis Bernardez, John Goldsmith, Steven Haney, Karen Jefferson, Terry Johnson, Alvin Leung, Donna O'Connell, William Replogle, John Wronosky, Kenneth Blaedel, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Henry Chapman, Stefan Wurm, Eric Panning, Pei-yang Yan, Guojing Zhang, John Bjorkholm, Glenn Kubiak, Donald Sweeney, David Attwood, Charles Gwyn
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472300
KEYWORDS: Extreme ultraviolet, Lithography, Projection systems, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Reticles, Printing, Point spread functions, Image resolution

Proceedings Article | 21 July 2000 Paper
Neal Fornaciari, Jim Chang, Daniel Folk, Steven Gianoulakis, John Goldsmith, Glenn Kubiak, Bruce Long, Donna O'Connell, Gregory Shimkaveg, William Silfvast, Kenneth Stewart
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390047
KEYWORDS: Capillaries, Extreme ultraviolet, Electrodes, Plasma, Fiber optic illuminators, Thermal modeling, Extreme ultraviolet lithography, Reflectivity, Semiconducting wafers, Lithography

Proceedings Article | 30 December 1999 Paper
Gregory Cardinale, John Goldsmith, Avijit Ray-Chaudhuri, Aaron Fisher, Scott Hector, Pawitter Mangat, Zorian Masnyj, David Mancini, Bill Wilkinson, Jeffrey Bokor, Seongtae Jeong, Scott Burkhart, Charles Cerjan, Christopher Walton, Cindy Larson, Pei-yang Yan, Guojing Zhang
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373339
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Inspection, Chromium, Scanning electron microscopy, Reticles, Silicon films, Printing

Proceedings Article | 25 June 1999 Paper
John Goldsmith, Kurt Berger, Dan Bozman, Gregory Cardinale, Daniel Folk, Craig Henderson, Donna O'Connell, Avijit Ray-Chaudhuri, Kenneth Stewart, Daniel Tichenor, Henry Chapman, Richard Gaughan, Russell Hudyma, Claude Montcalm, Eberhard Spiller, John Taylor, Jeffrey Williams, Kenneth Goldberg, Eric Gullikson, Patrick Naulleau, Jonathan Cobb
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351097
KEYWORDS: Cameras, Extreme ultraviolet, Imaging systems, Lithography, Extreme ultraviolet lithography, Projection systems, Photoresist developing, Photomasks, Wavefronts, Photoresist materials

Proceedings Article | 25 June 1999 Paper
Eric Gullikson, Sherry Baker, John Bjorkholm, Jeffrey Bokor, Kenneth Goldberg, John Goldsmith, Claude Montcalm, Patrick Naulleau, Eberhard Spiller, Daniel Stearns, John Taylor, James Underwood
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351162
KEYWORDS: Scattering, Cameras, Mirrors, Extreme ultraviolet, Spatial frequencies, Point spread functions, Light scattering, Multilayers, Laser scattering, Coating

Proceedings Article | 25 June 1999 Paper
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351138
KEYWORDS: Extreme ultraviolet, Wavefronts, Cameras, Interferometry, Interferometers, Optical coatings, Monochromatic aberrations, Multilayers, Contamination, Lithography

Proceedings Article | 5 June 1998 Paper
John Goldsmith, Pamela Barr, Kurt Berger, Luis Bernardez, Gregory Cardinale, Joel Darnold, Daniel Folk, Steven Haney, Craig Henderson, Karen Jefferson, Kevin Krenz, Glenn Kubiak, Rodney Nissen, Donna O'Connell, Yon Perras, Avijit Ray-Chaudhuri, Tony Smith, Richard Stulen, Daniel Tichenor, Alfred Ver Berkmoes, John Wronosky
Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309570
KEYWORDS: Extreme ultraviolet, Cameras, Imaging systems, Projection systems, Semiconducting wafers, Wavefronts, Extreme ultraviolet lithography, Photomasks, Xenon, Interferometry

Proceedings Article | 5 June 1998 Paper
Craig Henderson, David Wheeler, Tim Pollagi, Donna O'Connell, John Goldsmith, Aaron Fisher, Gregory Cardinale, John Hutchinson, Veena Rao
Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309590
KEYWORDS: Extreme ultraviolet lithography, Etching, Digital micromirror devices, Line edge roughness, Photomasks, Photoresist processing, Silicon, Extreme ultraviolet, Photoresist materials, Image processing

Showing 5 of 10 publications
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