Heidi Kwon
at Lam Research Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2019 Presentation + Paper
Ik-Hyun Jeong , Seung-Woo Koo, Hyun-Sok Kim, Jae-Wuk Ju, Young-Sik Kim, Yong-Tae Cho, Heung-Joo Kim, Katja Viatkina, Tom van Hemert, Ruud de Wit, David Deckers, Owen Chen, Nang-Lyeom Oh, Marcus Musselman, Marcus Carbery, Ssuwei Chen, Lucian Schmidt, Heidi Kwon, Jae Gyoo Lee
Proceedings Volume 10963, 1096308 (2019) https://doi.org/10.1117/12.2516578
KEYWORDS: Etching, Overlay metrology, Scanners, Semiconducting wafers, Metrology, Critical dimension metrology, Lithography, Plasma, Process control, Optical lithography

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top