CONFERENCE PROCEEDINGS
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Guen-Ho Hwang
at Photronics Inc
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Publications (4)
Proceedings Article | 27 May 2010 Paper
Pinhole defect study and process optimization
Won-Hee Chae, Guen-Ho Hwang, Soon-Kyu Seo, Dae-Han Kim, Dong-Heok Lee, Moon-Hwan Choi, Sang-Soo Choi, Dong-Gun Kim, Doo-Hoon Geum, Gi-Su Nam
Proceedings Volume 7748, 774812 (2010) https://doi.org/10.1117/12.867968
KEYWORDS: Photoresist developing, Photoresist materials, Liquids, Photoresist processing, Polymers, Dry etching, Adsorption, Electron beams, Electron beam lithography, Image processing
Proceedings Article | 23 September 2009 Paper
Improved particle control by adopting advanced ceramic materials in dry etcher for defect reduction
Dong-Soo Min, Guen-Ho Hwang, Dong-Heck Lee, Sang-Soo Choi, Hyo-Seok Son, Hyung-Jae Lee, Seung-Mun Son, Kyung-Ho Park
Proceedings Volume 7488, 74882Z (2009) https://doi.org/10.1117/12.833515
KEYWORDS: Plasma, Ceramics, Plasma treatment, Polishing, Particles, Etching, Surface roughness, Scanning electron microscopy, Resistance, Raw materials
Proceedings Article | 17 October 2008 Paper
Effects of photo resist erosion in development on critical dimension performance for 45nm node and below
Guen-Ho Hwang, Dong-Hyun Kim, Chu-bong Yu, Byeng-Sun Kang, Ik-Boum Hur, Cheol Shin, Sung-Mo Jung, Sang-Soo Choi
Proceedings Volume 7122, 71223A (2008) https://doi.org/10.1117/12.802741
KEYWORDS: Dry etching, Critical dimension metrology, Scanning electron microscopy, Photomasks, Resolution enhancement technologies, SRAF, Photoresist processing, Vestigial sideband modulation, Scattering, Backscatter
Proceedings Article | 19 May 2008 Paper
Patterning capability and limitations by pattern collapse in 45nm and below node photo mask production
Guen-Ho Hwang, Manish Patil, Soon-Kyu Seo, Chu-Bong Yu, Ik-Boum Hur, Dong Hyun Kim, Cheol Shin, Sung-Mo Jung, Yong-Hyun Lee, Sang-Soo Choi
Proceedings Volume 7028, 702824 (2008) https://doi.org/10.1117/12.793081
KEYWORDS: Etching, Photomasks, SRAF, Optical lithography, Dry etching, Photoresist processing, Photoresist materials, Capillaries, Lithography, Manufacturing
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