Mr. Christophe Smeets Profile

Christophe Smeets

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 10 April 2024 Presentation

0.33 NA EUV systems for high-volume manufacturing

Peter Klomp, Roderik van Es, Stuart Young, Christophe Smeets

Proceedings Volume PC12953, PC129530O (2024) https://doi.org/10.1117/12.3014165

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Sustainability, Semiconducting wafers, Reliability, Overlay metrology, Logic devices, Critical dimension metrology, Control systems

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Proceedings Article | 22 November 2023 Presentation

0.33 NA EUV systems for high volume manufacturing

Stuart Young, Pieter Gunter, Emiel Eussen, Christophe Smeets, Roderik van Es

Proceedings Volume PC12750, PC127500N (2023) https://doi.org/10.1117/12.2692698

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Proceedings Article | 28 April 2023 Presentation + Paper

0.33 NA EUV systems for high volume manufacturing

Christophe Smeets, Nico Benders, Frank Bornebroek, Joe Carbone, Roderik van Es, Arthur Minnaert, Guido Salmaso, Stuart Young

Proceedings Volume 12494, 1249406 (2023) https://doi.org/10.1117/12.2658046

KEYWORDS: Extreme ultraviolet, High volume manufacturing, Semiconducting wafers, Carbon, Wavefront errors, Wavefront aberrations, Semiconductors, Scanners

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Proceedings Article | 16 November 2022 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Guido Salmaso, Joe Carbone, Marcel Mastenbroek, Nico Benders, Roderik Van Es

Proceedings Volume PC12292, PC1229202 (2022) https://doi.org/10.1117/12.2644629

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Critical dimension metrology, Control systems

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Proceedings Article | 13 June 2022 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Guido Salmaso, Joe Carbone, Marcel Mastenbroek, Nico Benders, Roderik van Es, Roelof de Graaf

Proceedings Volume PC12051, PC1205103 (2022) https://doi.org/10.1117/12.2614220

KEYWORDS: Critical dimension metrology, Control systems, High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic

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Proceedings Article | 30 September 2021 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Roderik Van Es, Roelof De Graaf, Leon Levasier, Marcel Mastenbroek, Eric Verhoeven

Proceedings Volume 11854, 1185404 (2021) https://doi.org/10.1117/12.2600961

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic, Critical dimension metrology, Control systems

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Proceedings Article | 10 October 2019 Paper

EUV reticle defectivity protection options

Michael Lercel, Christophe Smeets, Mark van de Kerkhof, Amo Chen, Tjarko van Empel, Vadim Banine

Proceedings Volume 11148, 111480Y (2019) https://doi.org/10.1117/12.2535396

KEYWORDS: Pellicles, Extreme ultraviolet, Scanners, Reticles, Inspection, Extreme ultraviolet lithography, Manufacturing, Deep ultraviolet, Statistical modeling, Statistical analysis

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Proceedings Article | 26 March 2019 Presentation + Paper

Advanced particle contamination control in EUV scanners

Mark van de Kerkhof, Tjarko van Empel, Michael Lercel, Christophe Smeets, Ferdi van de Wetering, Andrey Nikipelov, Christian Cloin, Andrei Yakunin, Vadim Banine

Proceedings Volume 10957, 109570U (2019) https://doi.org/10.1117/12.2514874

KEYWORDS: Particles, Reticles, Scanners, Pellicles, Plasma, Extreme ultraviolet, Particle contamination

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Showing 5 of 8 publications

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