Christophe Smeets
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12953, PC129530O (2024) https://doi.org/10.1117/12.3014165
KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Sustainability, Semiconducting wafers, Reliability, Overlay metrology, Logic devices, Critical dimension metrology, Control systems

Proceedings Article | 22 November 2023 Presentation
Stuart Young, Pieter Gunter, Emiel Eussen, Christophe Smeets, Roderik van Es
Proceedings Volume PC12750, PC127500N (2023) https://doi.org/10.1117/12.2692698

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 1249406 (2023) https://doi.org/10.1117/12.2658046
KEYWORDS: Extreme ultraviolet, High volume manufacturing, Semiconducting wafers, Carbon, Wavefront errors, Wavefront aberrations, Semiconductors, Scanners

Proceedings Article | 16 November 2022 Presentation
Proceedings Volume PC12292, PC1229202 (2022) https://doi.org/10.1117/12.2644629
KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Critical dimension metrology, Control systems

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC1205103 (2022) https://doi.org/10.1117/12.2614220
KEYWORDS: Critical dimension metrology, Control systems, High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic

Proceedings Article | 30 September 2021 Presentation
Proceedings Volume 11854, 1185404 (2021) https://doi.org/10.1117/12.2600961
KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic, Critical dimension metrology, Control systems

Proceedings Article | 10 October 2019 Paper
Proceedings Volume 11148, 111480Y (2019) https://doi.org/10.1117/12.2535396
KEYWORDS: Pellicles, Extreme ultraviolet, Scanners, Reticles, Inspection, Extreme ultraviolet lithography, Manufacturing, Deep ultraviolet, Statistical modeling, Statistical analysis

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109570U (2019) https://doi.org/10.1117/12.2514874
KEYWORDS: Particles, Reticles, Scanners, Pellicles, Plasma, Extreme ultraviolet, Particle contamination

Showing 5 of 8 publications
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