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Dr. Brian M. Trafas
Vice President Marketing at KLA Corp
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 5 May 2005 Paper
Design and process limited yield at the 65-nm node and beyond
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.605369
KEYWORDS: Lithography, Metrology, Data modeling, Process control, Design for manufacturing, Line width roughness, Immersion lithography, Critical dimension metrology, Overlay metrology, Single crystal X-ray diffraction
Proceedings Article | 7 July 1997 Paper
Advanced inspection for 0.25-um-generation semiconductor manufacturing
Arye Shapiro, Thomas James, Brian Trafas
Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275937
KEYWORDS: Contamination, Optical spheres, Metals, Silicon, Manufacturing, Reliability, Inspection, Wafer inspection, Semiconductor manufacturing, Semiconducting wafers
Proceedings Article | 22 September 1995 Paper
Meeting advanced pattern inspection system requirements for 0.25-um technology and beyond
Proceedings Volume 2635, (1995) https://doi.org/10.1117/12.221460
KEYWORDS: Optical spheres, Defect detection, Metals, Image processing, Reliability, Inspection, Wafer inspection, Semiconducting wafers, Prototyping, Laser systems engineering
Proceedings Article | 18 September 1995 Paper
New laser scanning techniques for wafer inspection
Mehrdad Nikoonahad, Brian Leslie, Stanley Stokowski, Brian Trafas, Keith Wells
Proceedings Volume 2638, (1995) https://doi.org/10.1117/12.221207
KEYWORDS: Polarization, Scattering, Particles, Silicon, Light scattering, Inspection, Laser scanners, Wafer inspection, Semiconducting wafers, Dielectric polarization
Proceedings Article | 22 May 1995 Paper
Extendibility of laser scanning tools for advanced wafer inspection
Brian Trafas, Mehrdad Nikoonahad, Keith Wells, R. Johnson, Stanley Stokowski
Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209199
KEYWORDS: Wafer-level optics, Scattering, Particles, Light scattering, Inspection, Laser scanners, Wafer inspection, Semiconducting wafers, Signal detection, Laser systems engineering
Conference Committee Involvement (4)
Metrology, Inspection, and Process Control for Microlithography XXII
25 February 2008 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXI
26 February 2007 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XX
20 February 2006 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XIX
28 February 2005 | San Jose, California, United States
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