CONFERENCE PROCEEDINGS
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Dr. Bencherki Mebarki
at Applied Materials Inc
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Author
Publications (3)
Proceedings Article | 12 April 2013 Paper
Impact of process decisions and alignment strategy on overlay for the 14nm node
Proceedings Volume 8683, 868306 (2013) https://doi.org/10.1117/12.2011968
KEYWORDS: Optical alignment, Etching, Back end of line, Metals, Copper, Double patterning technology, Chemical mechanical planarization, Scanners, Neodymium, Optical lithography
Proceedings Article | 23 March 2011 Paper
Innovative self-aligned triple patterning for 1x half pitch using single "spacer deposition-spacer etch" step
Bencherki Mebarki, Hao D. Chen, Yongmei Chen, Aunchan Wang, Jingmei Liang, Kedar Sapre, Tushar Mandrekar, Xiaolin Chen, Ping Xu, Pokhui Blanko, Christopher Ngai, Chris Bencher, Mehul Naik
Proceedings Volume 7973, 79730G (2011) https://doi.org/10.1117/12.881574
KEYWORDS: Etching, Optical lithography, Photomasks, Oxides, Immersion lithography, Tin, Dry etching, Critical dimension metrology, Back end of line, Dielectrics
Proceedings Article | 4 March 2010 Paper
Self-aligned double patterning process for 32/32nm contact/space and beyond using 193 immersion lithography
Bencherki Mebarki, Liyan Miao, Yongmei Chen, James Yu, Pokhui Blanco, James Makeeff, Jen Shu, Christopher Bencher, Mehul Naik, Christopher Sui Wing Ngai
Proceedings Volume 7640, 764023 (2010) https://doi.org/10.1117/12.862583
KEYWORDS: Double patterning technology, Photomasks, Etching, Optical lithography, Immersion lithography, Silicon, Extreme ultraviolet lithography, 193nm lithography, Lithography, Oxides
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