An Exposure Controlled Projection Lithography (ECPL) process with the ability to fabricate microlenses on
transparent substrates is presented. This process (also referred to as maskless lithography) can be used to
create polymer microlenses on flat or curved substrates without involving hard tooling. Incident radiation,
patterned by a dynamic mask, passes through a transparent substrate to cure photopolymer resin that grows
progressively from the substrate surface. A process planning algorithm which incorporates the effects of
optical aberrations present in the ECPL system and photopolymer's response to irradiation is presented. An
interferometric process monitoring system is also presented which can be used to control the process in real
time. Samples of micro optical elements fabricated on flat and non-planar substrates using the ECPL system
are also presented, which demonstrate the wide range of fabrication capability of our ECPL process.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.