Dr. Alexander A. Schafgans
at ASML San Diego
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940Z (2023) https://doi.org/10.1117/12.2657772
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, High volume manufacturing, Plasma, Light sources, Gas lasers, Scanners, Tin, EUV optics

Proceedings Article | 22 February 2021 Poster + Presentation
Proceedings Volume 11609, 116091E (2021) https://doi.org/10.1117/12.2584413
KEYWORDS: Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Tin, Semiconductors, Laser stabilization, Laser applications, High volume manufacturing

Proceedings Article | 9 September 2019 Presentation
Michael Purvis, Igor Fomenkov, Alexander Schafgans, Peter Mayer, Klaus Hummler, Martijn Leenders, Yezheng Tao, Slava Rokitski, Jayson Stewart, Alex Ershov, Robert Rafac, Silvia De Dea, Georgiy Vaschenko, David Brandt, Daniel Brown
Proceedings Volume 11111, 111110K (2019) https://doi.org/10.1117/12.2534691

Proceedings Article | 3 October 2018 Presentation + Paper
Igor Fomenkov, Michael Purvis, Alexander Schafgans, Yezheng Tao, Slava Rokitski, Jayson Stewart, Andrew LaForge, Alexander Ershov, Robert Rafac, Silvia De Dea, Chirag Rajyaguru, Georgiy Vaschenko, Mathew Abraham, David Brandt, Daniel Brown
Proceedings Volume 10809, 108091L (2018) https://doi.org/10.1117/12.2502801
KEYWORDS: Extreme ultraviolet, High volume manufacturing

Proceedings Article | 10 May 2018 Paper
Michael Purvis, Igor Fomenkov, Alexander Schafgans, Mike Vargas, Spencer Rich, Yezheng Tao, Slava Rokitski, Melchior Mulder, Erik Buurman, Michael Kats, Jayson Stewart, Andrew LaForge, Chirag Rajyaguru, Georgiy Vaschenko, Alex Ershov, Robert Rafac, Mathew Abraham, David Brandt, Daniel Brown
Proceedings Volume 10583, 1058327 (2018) https://doi.org/10.1117/12.2305955
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Plasma, Tin, High volume manufacturing, Semiconducting wafers, Reflectivity, EUV optics, Photoresist materials

Showing 5 of 11 publications
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