Dr. Carmen Zoldesi Profile

Dr. Carmen Zoldesi

at ASML Netherlands BV

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Publications (6)

Proceedings Article | 18 March 2016 Paper

NXE pellicle: offering a EUV pellicle solution to the industry

Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Peter Delmastro, Dennis de Graaf, Paul Janssen, Mark van de Kerkhof, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Frits van der Meulen, David Ockwell, Maria Peter, Daniel Smith, Beatrijs Verbrugge, David van de Weg, Jim Wiley, Noelie Wojewoda, Carmen Zoldesi, Pieter van Zwol

Proceedings Volume 9776, 97761Y (2016) https://doi.org/10.1117/12.2221909

KEYWORDS: Pellicles, Extreme ultraviolet, Imaging systems, Reticles, Optical lithography, Inspection, Scanners, High volume manufacturing, Particles, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks

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Proceedings Article | 18 March 2016 Paper

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Martijn van Noordenburg, Roderik van Es, Eric Verhoeven, Henk Meijer, Arthur Minnaert, Jan-Willem van der Horst, Hans Meiling, Joerg Mallmann, Christian Wagner, Judon Stoeldraijer, Geert Fisser, Jo Finders, Carmen Zoldesi, Uwe Stamm, Herman Boom, David Brandt, Daniel Brown, Igor Fomenkov, Michael Purvis

Proceedings Volume 9776, 97760A (2016) https://doi.org/10.1117/12.2220423

KEYWORDS: Extreme ultraviolet, Overlay metrology, Extreme ultraviolet lithography, Manufacturing, Pellicles, Logic devices, Semiconducting wafers, Reticles, Photomasks, Scanners, Fiber optic illuminators, Tin

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Proceedings Article | 13 March 2015 Paper

Performance overview and outlook of EUV lithography systems

Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Arthur W. Minnaert, Martijn van Noordenburg, Jörg Mallmann, Noreen Harned, Judon Stoeldraijer, Christian Wagner, Carmen Zoldesi, Eelco van Setten, Jo Finders, Koen de Peuter, Chris de Ruijter, Milos Popadic, Roger Huang, Martin Lin, Frank Chuang, Roderik van Es, Marcel Beckers, David Brandt, Nigel Farrar, Alex Schafgans, Daniel Brown, Herman Boom, Hans Meiling, Ron Kool

Proceedings Volume 9422, 94221P (2015) https://doi.org/10.1117/12.2085912

KEYWORDS: Semiconducting wafers, Pellicles, Extreme ultraviolet, Reticles, Extreme ultraviolet lithography, Imaging systems, Logic, Scanners, Manufacturing, Overlay metrology

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Proceedings Article | 17 April 2014 Paper

Progress on EUV pellicle development

Carmen Zoldesi, Kursat Bal, Brian Blum, Guus Bock, Derk Brouns, Florian Dhalluin, Nina Dziomkina, Juan Diego Arias Espinoza, Joost de Hoogh, Silvester Houweling, Maarten Jansen, Mohammad Kamali, Alain Kempa, Ronald Kox, Robert de Kruif, Jorge Lima, Yang Liu, Henk Meijer, Hans Meiling, Ijen van Mil, Marco Reijnen, Luigi Scaccabarozzi, Daniel Smith, Beatrijs Verbrugge, Laurens de Winters, Xugang Xiong, John Zimmerman

Proceedings Volume 9048, 90481N (2014) https://doi.org/10.1117/12.2049276

KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Reticles, Prototyping, Silicon, Manufacturing, Particles, Critical dimension metrology, Protactinium

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Proceedings Article | 1 April 2009 Paper

Improvements in process performance for immersion technology high volume manufacturing

K. Nafus, T. Shimoaoki, M. Enomoto, H. Shite, T. Otsuka, H. Kosugi, T. Shibata, J. Mallmann, R. Maas, C. Verspaget, E. van der Heijden, E. van Setten, J. Finders, S. Wang, N. Boudou, C. Zoldesi

Proceedings Volume 7273, 727338 (2009) https://doi.org/10.1117/12.813485

KEYWORDS: Semiconducting wafers, Particles, Scanners, Critical dimension metrology, Photomicroscopy, Photoresist processing, Contamination, Etching, Polymers, Bridges

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Proceedings Article | 4 April 2008 Paper

Process manufacturability evaluation for next generation immersion technology node

M. Enomoto, T. Shimoaoki, T. Otsuka, S. Hatakeyama, K. Nafus, R. Naito, Y. Terashita, T. Shibata, H. Kosugi, M. Jyousaka, J. Mallmann, R. Maas, M. Blanco Mantecon, E. van Setten, J. Finders, S. Wang, C. Zoldesi

Proceedings Volume 6923, 69231W (2008) https://doi.org/10.1117/12.772552

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Manufacturing, Inspection, Standards development, Scanners, Bridges, Particles, Metrology, High volume manufacturing

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Showing 5 of 6 publications

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