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Ahmed Mohammad
at Eulitha AG
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Publications (1)
Proceedings Article | 10 April 2024 Presentation
300mm+ substrate UV/DUV low-cost, reliable periodic patterning solution for high-volume manufacturing
Kelsey Wooley, Harun Solak, Christian Dais, Francis Clube, Ahmed Mohammad, Iuliia Bykova, Thibault Seure, Mehdi Heydari, Matthew Wilson, Li Wang
Proceedings Volume PC12956, PC129560O (2024) https://doi.org/10.1117/12.3013328
KEYWORDS: Optical lithography, Semiconducting wafers, Photomasks, Lithography, High volume manufacturing, Photonics, Ultraviolet radiation, Standards development, Projection lithography, Deep ultraviolet
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