Spectroellipsometric studies on TiNx films deposited on glass

Gabriela Pavelescu; Mariana Braic; Viorel Braic; Laura Melinte; Dorin Melinte

doi:10.1117/1.600625

1 May 1996 Spectroellipsometric studies on TiNx films deposited on glass

Gabriela Pavelescu, Mariana Braic, Viorel Braic, Laura Melinte, Dorin Melinte

Optical Engineering, Vol. 35, Issue 5, (May 1996). https://doi.org/10.1117/1.600625

TiNx films are deposited on glass in a modified dc planar three-magnetron geometry. The ellipsometric and reflectance measurements reveal the influence of the substrate bias and of the Ar:N2 partial pressure ratio on the stoichiometry and optical properties of the films. The stoichiometric structure is obtained for only certain bias voltage and Ar:N2 ratio values. The value of the plasma energy wp confirmed the film stoichiometry, as determined from x-ray diffractometry.

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Gabriela Pavelescu, Mariana Braic, Viorel Braic, Laura Melinte, and Dorin Melinte "Spectroellipsometric studies on TiNx films deposited on glass," Optical Engineering 35(5), (1 May 1996). https://doi.org/10.1117/1.600625

Published: 1 May 1996

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