Paper
28 November 1983 Selective Transmission Of Thin TiN-Films
E. Valkonen, T. Karlsson, B. Karlsson, B. o. Tohansson
Author Affiliations +
Proceedings Volume 0401, Thin Film Technologies I; (1983) https://doi.org/10.1117/12.935541
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland
Abstract
The solar selective properties of thin titanium nitride films have been studied. High quality TiN-films were made on fused silica and glass substrates by reactive sputtering of titanium in a nitrogen atmosphere. The resulting film thicknesses ranged from 5 - 120 nm. The reflectance and transmittance measurements confirm the high solar and visible transmission previously calculated from optical constants. The infrared reflection is lower than calculated, but sufficiently high to make TiN a new competitor for selective transmission applications. Three optical parameters were determined and used to obtain the optical constants as well as the film thickness. The refractive index increases with decreasing thickness. The extinction coefficient is almost constant above the thickness of 12 nm, but strongly reduced for films thinner than this.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E. Valkonen, T. Karlsson, B. Karlsson, and B. o. Tohansson "Selective Transmission Of Thin TiN-Films", Proc. SPIE 0401, Thin Film Technologies I, (28 November 1983); https://doi.org/10.1117/12.935541
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Cited by 9 scholarly publications.
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KEYWORDS
Reflectivity

Tin

Transmittance

Opacity

Thin films

Titanium

Sputter deposition

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