Regeneration of imprint molds using vacuum ultraviolet light

Masashi Nakao; Masanori Yamaguchi; Shintaro Yabu

doi:10.1117/12.879397

15 April 2011 Regeneration of imprint molds using vacuum ultraviolet light

Masashi Nakao, Masanori Yamaguchi, Shintaro Yabu

Proceedings Volume 7972, Advances in Resist Materials and Processing Technology XXVIII; 79722M (2011) https://doi.org/10.1117/12.879397
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Etching characteristics of various resins by a vacuum ultraviolet (VUV, λ=172 nm) light have been examined under conditions of exposure time, substrate temperature, radiation distance and ambient oxygen concentration. The VUV light have used to clean the imprinted molds which are contaminated by organic substances such as ultraviolet-resins through many times of imprinting processes, and it has revealed that the VUV light has effectively regenerated the contaminated molds manufactured by quartz, silicon-carbide and nickel.

Citation Download Citation

Masashi Nakao, Masanori Yamaguchi, and Shintaro Yabu "Regeneration of imprint molds using vacuum ultraviolet light", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79722M (15 April 2011); https://doi.org/10.1117/12.879397

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