UV-nanoimprint lithography using a diamond-like carbon stamp

Jun-ho Jeong; Ki-don Kim; Young-suk Sim; Dae-geun Choi; Eung-sug Lee; Sang-hu Park; Tae-woo Lim; Dong-yol Yang

doi:10.1117/12.657132

24 March 2006 UV-nanoimprint lithography using a diamond-like carbon stamp

Jun-ho Jeong, Ki-don Kim, Young-suk Sim, Dae-geun Choi, Eung-sug Lee, Sang-hu Park, Tae-woo Lim, Dong-yol Yang

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61512J (2006) https://doi.org/10.1117/12.657132
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Two-dimensional (2-D) and three-dimensional (3-D) diamond-like carbon (DLC) stamps for ultraviolet nanoimprint lithography (UV-NIL) were fabricated with two methods: namely, two-photon polymerization (TPP) patterning, followed by nanoscale-thick DLC coating; and a fluorine-doped (F-DLC) coating process, followed by O₂ plasma etching. The DLC layer on top of polymer pattern or flat quartz substrate was formed using radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) process or Direct current (DC) and radio frequency (RF) magnetron sputtering process. It was also demonstrated that the DLC stamp with no anti-adhesion layer could be used for imprinting wafers on UV-NIL and the dimensions of the stamp's features correlated well with the corresponding imprinted features.

Citation Download Citation

Jun-ho Jeong, Ki-don Kim, Young-suk Sim, Dae-geun Choi, Eung-sug Lee, Sang-hu Park, Tae-woo Lim, and Dong-yol Yang "UV-nanoimprint lithography using a diamond-like carbon stamp", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61512J (24 March 2006); https://doi.org/10.1117/12.657132

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