A High Resolution Dimensional Metrology System For Masks

H. Becker; D. Elliott; W. Hunn

doi:10.1117/12.940418

17 April 1987 A High Resolution Dimensional Metrology System For Masks

H. Becker, D. Elliott, W. Hunn

Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987) https://doi.org/10.1117/12.940418
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

The continuous advance of microlithographic fabrication techniques into the submicron structure range requires a new generation of metrology systems to measure with an accuracy and throughput necessary for the demands of VLSI technology.

Citation Download Citation

H. Becker, D. Elliott, and W. Hunn "A High Resolution Dimensional Metrology System For Masks", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940418

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