Ultra-sensitive optical metrology for hard disk DTR and BPM imprints

Jeffrey Roberts; Linlin Hu; Iris Bloomer; Shih-Fu Lee; Yongdong Liu

doi:10.1117/12.837146

11 December 2009 Ultra-sensitive optical metrology for hard disk DTR and BPM imprints

Jeffrey Roberts, Linlin Hu, Iris Bloomer, Shih-Fu Lee, Yongdong Liu

Proceedings Volume 7520, Lithography Asia 2009; 75200I (2009) https://doi.org/10.1117/12.837146
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan

Abstract

With pitches in the double-digit nanometer range and depths in the single-digit nanometer range, superior sensitivity is a necessary metrology requirement for patterned media. Variations in depth, CD, and sidewall angle on the order of the desired measurement precision will change the measured raw data by a miniscule amount, around one per cent or less. It is shown that the required sensitivity can be achieved with polarized broad band reflectance and transmittance incorporating optimized signal-to-noise and analysis based on Rigorous Coupled-Wave Analysis (RCWA) in conjunction with the Forouhi-Bloomer dispersion equations for optical properties, n and k. The measurement capabilities are demonstrated with simulations and examples of various DTR and BPM structures.

Citation Download Citation

Jeffrey Roberts, Linlin Hu, Iris Bloomer, Shih-Fu Lee, and Yongdong Liu "Ultra-sensitive optical metrology for hard disk DTR and BPM imprints", Proc. SPIE 7520, Lithography Asia 2009, 75200I (11 December 2009); https://doi.org/10.1117/12.837146

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