Contrast management of 193i interferometry to be close to scanners contrast conditions

Alexandre Lagrange; Philippe Bandelier; Christelle Charpin; Olivier Lartigue

doi:10.1117/12.772584

7 March 2008 Contrast management of 193i interferometry to be close to scanners contrast conditions

Alexandre Lagrange, Philippe Bandelier, Christelle Charpin, Olivier Lartigue

Proceedings Volume 6924, Optical Microlithography XXI; 69242G (2008) https://doi.org/10.1117/12.772584
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

When projected with a scanner, the latent image intensity in the photoresist has a slope that can be much lower than with an interferometer. To study finely the lithographic process and to be predictive, the Normalized image slope of 193 nm immersion interferometer built at LETI has to be controlled. The exposure latitude (EL), the Normalized Image Log Slope (NILS) and the interference contrast are closely related.

Citation Download Citation

Alexandre Lagrange, Philippe Bandelier, Christelle Charpin, and Olivier Lartigue "Contrast management of 193i interferometry to be close to scanners contrast conditions", Proc. SPIE 6924, Optical Microlithography XXI, 69242G (7 March 2008); https://doi.org/10.1117/12.772584

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