Lithographic performance of a new generation i-line optical system: a comparative analysis

Gary E. Flores; Warren W. Flack; Lynn Dwyer

doi:10.1117/12.150487

8 August 1993 Lithographic performance of a new generation i-line optical system: a comparative analysis

Gary E. Flores, Warren W. Flack, Lynn Dwyer

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150487
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

A new generation i-line optical stepper utilizing the established benefits of the 1x Wynne- Dyson lens design has been developed for mix-and-match lithography. Based on the advantages of cost of ownership and high throughput capability, the Ultratech 2244i was specifically designed as a cost effective approach to complement high NA reduction steppers in a mix-and-match environment, especially for high volume DRAM and ASIC manufacturing. This system features an ultra-large image field of 22 X 44 mm with a 0.32 numerical aperture lens with an illumination bandwidth of 20 nanometers (355 to 375 nm). As a result, this system provides 0.8 micrometers manufacturing capability. These features provide improved critical dimension (CD) interference effects and superior depth-of-focus for the 2244i.

Citation Download Citation

Gary E. Flores, Warren W. Flack, and Lynn Dwyer "Lithographic performance of a new generation i-line optical system: a comparative analysis", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150487

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