Paper
23 February 2005 Development of NiFe micromagnet stripes for solid-state NMR quantum computing
Atsushi Takahashi, Dong F. Wang, Yoshinori Matsumoto, Kohei M. Itoh
Author Affiliations +
Proceedings Volume 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II; (2005) https://doi.org/10.1117/12.582248
Event: Smart Materials, Nano-, and Micro-Smart Systems, 2004, Sydney, Australia
Abstract
An all-silicon quantum computer architecture using 29Si nuclear spins qubits buried in the spin-free matrix of 28Si has been suggested. It requires an array of micro-magnets which impose a large magnetic field gradient along the chain of the 29Si nuclear spins qubits, which allow for the NMR frequency difference between two neighboring 29Si qubits. In this work, we report on the successful fabrication of an array of NiFe (Ni45%-Fe55%) micro-magnet stripes (the cross-section 1.2x1 μm2) formed directly on natural Si wafers using reactive ion etching (RIE) with the NH3-CO-Xe gas mixture. The magnetic field gradient calculation with the finite element method with the geometry of the fabricated NiFe stripes predicts the gradient of 0.4T/μm at the distance 100nm away from the micro-magnet when the stripes are placed in the static magnetic field of 6T for the NMR measurement. The magnetic property of fabricated NiFe stripes was also measured with SQUID, and confirmed that saturation magnetization hadn’t been deteriorated through RIE process.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Atsushi Takahashi, Dong F. Wang, Yoshinori Matsumoto, and Kohei M. Itoh "Development of NiFe micromagnet stripes for solid-state NMR quantum computing", Proc. SPIE 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, (23 February 2005); https://doi.org/10.1117/12.582248
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KEYWORDS
Magnetism

Silicon

Reactive ion etching

Quantum communications

Quantum computing

Microfabrication

Plasma

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