Paper
22 February 2001 MCT heterostructure design and growth by MBE for IR devices
Author Affiliations +
Proceedings Volume 4355, Fifth International Conference on Material Science and Material Properties for Infrared Optoelectronics; (2001) https://doi.org/10.1117/12.417790
Event: Fifth International Conference on Material Science and Material Properties for Infrared Optoelectronics, 2000, Kiev, Ukraine
Abstract
The molecular beam epitaxy (MBE) set-up with analytical control equipment of growth process was designed and fabricated for growing A2B6 compounds including the mercury-containing ones. A technology was elaborated for growing mercury-cadmium-telluride (MCT) solid solution heteroepitaxial structures (HS) by molecular beam epitaxy (MBE) method with a given variation of MCT composition throughout the thickness. HS's MCT MBE on CdZnTe/GaAs substrate with different variation composition in layers at MCT film interfaces were designing and growing. These structures were used for manufacture of high quality single, linear and array photoconductors (PC) and photodiodes (PD) operating at 77 K and 200 - 250 K temperature in the wavelength range of 3 - 5 micrometer and 8 - 12 micrometer, up and over 20 micrometer. Widegap layers at MCT film interfaces are used as passivating coating. Narrowgap layer at MCT film/CdZnTe buffer layers interface is used for decrease of PD series resistance. For decrease of dark currents of photodiodes array operating at 200 K HS MCT MBE were used with special composition distribution of composition throughout the thickness.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuri G. Sidorov, Sergey A. Dvoretsky, Nikolay N. Mikhailov, M. V. Yakushev, Vasily S. Varavin, Vladimir V. Vasilyev, A. O. Suslyakov, and Victor N. Ovsyuk "MCT heterostructure design and growth by MBE for IR devices", Proc. SPIE 4355, Fifth International Conference on Material Science and Material Properties for Infrared Optoelectronics, (22 February 2001); https://doi.org/10.1117/12.417790
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Cited by 6 scholarly publications.
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KEYWORDS
Manufacturing

Palladium

Interfaces

Resistance

Photodiodes

Oxides

Photoresistors

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