Yield enhancement: photomask pellicles for use in flat panel display lithography

Gilbert Hong; Patrick St. Cin

doi:10.1117/12.172153

1 April 1994 Yield enhancement: photomask pellicles for use in flat panel display lithography

Gilbert Hong, Patrick St. Cin

Proceedings Volume 2174, Advanced Flat Panel Display Technologies; (1994) https://doi.org/10.1117/12.172153
Event: IS&T/SPIE 1994 International Symposium on Electronic Imaging: Science and Technology, 1994, San Jose, CA, United States

Abstract

Pellicles have been used on photomasks in the semiconductor industry for the past ten years as a means to enhance wafer yields. An overview of pellicle technology and yield improvements for the semiconductor industry will be presented. Single die reticles are used in both the semiconductor and display lithography; similar and dissimilar aspects of the use of pellicles between these two industries will be presented. The application of pellicles specific to display lithography will be presented as a means of enhancing yields.

Citation Download Citation

Gilbert Hong and Patrick St. Cin "Yield enhancement: photomask pellicles for use in flat panel display lithography", Proc. SPIE 2174, Advanced Flat Panel Display Technologies, (1 April 1994); https://doi.org/10.1117/12.172153

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