Subhalf-micron stepper with a reticle particle monitor

Michio Kohno; Nobuhiro Kodachi; Kazumi Yajima; Seiya Miura

doi:10.1117/12.150453

8 August 1993 Subhalf-micron stepper with a reticle particle monitor

Michio Kohno, Nobuhiro Kodachi, Kazumi Yajima, Seiya Miura

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150453
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

We developed subhalf micron steppers, the FPA-2500i2 and the FPA-2500i3 (abbreviated here as i2 and i3, respectively), suitable to 16 M and 64 M DRAM processes. These new steppers incorporate high sensitivity reticle particle monitors (RPM) in order to increase chip yield. In this report, first the steppers' basic performance is demonstrated. Secondly, the printability of particles and its influence on circuit patterns are quantified by simulations and experiments. Thirdly, the RPM's detection principle is discussed theoretically, and finally the experimental results are shown.

Citation Download Citation

Michio Kohno, Nobuhiro Kodachi, Kazumi Yajima, and Seiya Miura "Subhalf-micron stepper with a reticle particle monitor", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150453

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