Improvements in sensitivity and discrimination capability of the PD reticle/mask inspection system

Juichi Saito; Yutaka Saijo

doi:10.1117/12.29758

1 March 1991 Improvements in sensitivity and discrimination capability of the PD reticle/mask inspection system

Juichi Saito, Yutaka Saijo

Proceedings Volume 1496, 10th Annual Symp on Microlithography; (1991) https://doi.org/10.1117/12.29758
Event: 10th Annual Symposium on Microlithography, 1990, Sunnyvale, CA, United States

Abstract

The device density of integrated circuits has progressed with a 3 year cycle. The 256K DRAM was introduced in 1983 and the 4M DRAM will be in full production in 1990. The 5x stepper, which is the main lithography tool has progressed from G-line to I-line and it is said that the I-line will be able to achieve lithography for 16M DRAM's and some part of the 64 Megabit. We show the relation of this device trend compared with the required detection size of a particle and our particle detection system in TABLE 2.

Citation Download Citation

Juichi Saito and Yutaka Saijo "Improvements in sensitivity and discrimination capability of the PD reticle/mask inspection system", Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); https://doi.org/10.1117/12.29758

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