Reflective optical designs for soft x-ray projection lithography

Tanya E. Jewell; Kevin P. Thompson; J. Michael Rodgers

doi:10.1117/12.48683

1 December 1991 Reflective optical designs for soft x-ray projection lithography

Tanya E. Jewell, Kevin P. Thompson, J. Michael Rodgers

Proceedings Volume 1527, Current Developments in Optical Design and Optical Engineering; (1991) https://doi.org/10.1117/12.48683
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

All-reflective, unobscured optical designs were developed to help identify a candidate first- generation system to be used in soft x-ray projection lithography. The resolution goal for all designs was 0.1 micrometers , or better, at a design wavelength of 13 nm. Different design aspects including usable field size, image distortion, number of mirrors, telecentricity, surface shape (spherical versus aspheric), and system packaging were explored. Trade-off studied between systems requiring scanning and full-format nonscanning systems were made. The tolerance sensitivity analysis for a representative design demonstrated that as-built performance will be driven by the mirror surface irregularity tolerance; the required tolerance levels are briefly discussed.

Citation Download Citation

Tanya E. Jewell, Kevin P. Thompson, and J. Michael Rodgers "Reflective optical designs for soft x-ray projection lithography", Proc. SPIE 1527, Current Developments in Optical Design and Optical Engineering, (1 December 1991); https://doi.org/10.1117/12.48683

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