X-ray stepper development for volume production at Canon

Kouji Uda; Nobutoshi Mizusawa; Yutaka Tanaka; Yutaka Watanabe; Hideki Ina; Shunichi Uzawa

doi:10.1117/12.309632

5 June 1998 X-ray stepper development for volume production at Canon

Kouji Uda, Nobutoshi Mizusawa, Yutaka Tanaka, Yutaka Watanabe, Hideki Ina, Shunichi Uzawa

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309632
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

We describe some results of exposure experiments using the present prototype SR stepper which Canon has developed and the novel technology development which is necessary to establish the next generation SR stepper for volume production. Concerning the technology development, we have established (1) two mirror condensing system for full field exposure, (2) ADGL alignment method, (3) magnification correction method, (4) high speed stage stepping method. By adopting these technologies, we have been developing a beta- site machine for volume production and its features and preliminary specifications are described.

Citation Download Citation

Kouji Uda, Nobutoshi Mizusawa, Yutaka Tanaka, Yutaka Watanabe, Hideki Ina, and Shunichi Uzawa "X-ray stepper development for volume production at Canon", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309632

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