Assessing hybrid polymers as innovative photolithography material allowing advanced high aspect ratio/high resolution patterns for micro-optics and patterned passivation layers

M. Russew; A. Benker; J. Herrmann; T. Oberbiermann; S. Grützner; M. Koch; J. Wolf; A. Voigt; A. Schleunitz; G. Grützner

doi:10.1117/12.3010843

9 April 2024 Assessing hybrid polymers as innovative photolithography material allowing advanced high aspect ratio/high resolution patterns for micro-optics and patterned passivation layers

M. Russew, A. Benker, J. Herrmann, T. Oberbiermann, S. Grützner, M. Koch, J. Wolf, A. Voigt, A. Schleunitz, G. Grützner

Author Affiliations +

Proceedings Volume 12956, Novel Patterning Technologies 2024; 129560R (2024) https://doi.org/10.1117/12.3010843
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

Hybrid polymers are a class of materials especially suited for micro-optical applications due to their outstanding transmission and excellent stability towards temperature, chemicals and radiation. They are solvent-free viscous liquid and therefore UV-replication has become the most established process for their usage in micro-optics manufacture. However, they have also comparable processing behavior to classical photoresists and can be processed in versatile ways offering further possibilities for 2D and 3D structuring. Herein, we report on different UV-lithographical technologies to create high-aspect and high resolution pattern with hybrid polymers.

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M. Russew, A. Benker, J. Herrmann, T. Oberbiermann, S. Grützner, M. Koch, J. Wolf, A. Voigt, A. Schleunitz, and G. Grützner "Assessing hybrid polymers as innovative photolithography material allowing advanced high aspect ratio/high resolution patterns for micro-optics and patterned passivation layers", Proc. SPIE 12956, Novel Patterning Technologies 2024, 129560R (9 April 2024); https://doi.org/10.1117/12.3010843

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