Presentation + Paper
9 April 2024 Small pitch overlay imaging metrology targets for tight OPO control
Author Affiliations +
Abstract
Sub-2nm On Product Overlay (OPO), scribe line width reduction, and high-order scanner correctibles are driving innovative overlay (OVL) targets. One promising new imaging-based overlay (IBO) OVL target to address such challenging trends in multiple semiconductor segments is a small pitch AIM (sAIM). sAIM is in essence an IBO target with grating (previous layer) beside grating (current layer) which could be placed in a few layouts: square, rectangular, and Mosaic. In this work, we will present the sAIM operational concept and performance including Total Measurement Uncertainty (TMU), residuals, and accuracy (ADI on-target offset vs. ACI on-device or target), which is often referred to as Non-Zero Offset (NZO).
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Nikhil Aditya Kumar Roy, Richard Housley, Suresh Kumar, Ranga Reddy, Dan Engelhard, Hao Wang, Atsushi Miyafuji, Toshiharu Nishiyama, Yoel Feler, Diana Shaphirov, Mark Ghinovker, Ido Ashuah, Yoav Grauer, and Yonglei Li "Small pitch overlay imaging metrology targets for tight OPO control", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129551V (9 April 2024); https://doi.org/10.1117/12.3009769
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KEYWORDS
Overlay metrology

Semiconducting wafers

Light sources and illumination

Metrology

Imaging metrology

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