Photomask quality problems

Reynold M. Shoho

doi:10.1117/12.954849

20 September 1976 Photomask quality problems

Reynold M. Shoho

Proceedings Volume 0080, Developments in Semiconductor Microlithography; (1976) https://doi.org/10.1117/12.954849
Event: Developments in Semiconductor Microlithography, 1976, San Jose, CA, United States

Abstract

The problems associated with photomask production are categorized as follow:

Citation Download Citation

Reynold M. Shoho "Photomask quality problems", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954849

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