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Zhengkai Yang
at SHANGHAI Huali Microelectronics Corp
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Publications (1)
Proceedings Article | 18 March 2015 Paper
The study of lithography conditions to use advanced resist performance properly
Zhengkai Yang, Wuping Wang, Quan Chen, Hajime Aoyama, Kengo Takemasa, Toshihiko Sei, Tami Miyazawa, Tomoyuki Matsuyama, Chun Shao
Proceedings Volume 9426, 942621 (2015) https://doi.org/10.1117/12.2086062
KEYWORDS: Optical simulations, Critical dimension metrology, Scanners, Lithography, Photomasks, Optical proximity correction, Performance modeling, Photoresist processing, Immersion lithography, Data modeling
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