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Yu Hasegawa
at Tekscend Photomask Corp
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Publications (1)
Proceedings Article | 12 November 2024 Presentation + Paper
Development of advanced EUV mask absorbers with various properties
Daisuke Miyawaki, Daisuke Sakurai, Yu Hasegawa, Hideaki Nakano, Itaru Yoshida, Kazunori Seki, Yosuke Kojima
Proceedings Volume 13215, 132150F (2024) https://doi.org/10.1117/12.3033972
KEYWORDS: Extreme ultraviolet, Tantalum, Semiconducting wafers, Lithography, Simulations, Mask making, Film thickness, Reflectivity, Optical properties
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