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You Yu Lin
at Powerchip Technology Corporation
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Publications (1)
Proceedings Article | 29 March 2013 Paper
Pattern wiggling investigation of self-aligned double patterning for 2x nm node NAND Flash and beyond
You-Yu Lin, Chun-Chi Chen, Chia-Yu Li, Zih-Song Wang, Ching-Hua Chen
Proceedings Volume 8682, 86821C (2013) https://doi.org/10.1117/12.2010761
KEYWORDS: Etching, Carbon, Line edge roughness, Double patterning technology, FT-IR spectroscopy, Optical lithography, Dry etching, Refractive index, Lithography, Extreme ultraviolet lithography
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