In order to improve the uniformity of the contact pressure distribution of chemical mechanical polishing, based on the
Winkler foundation principle of mechanics and phyllotaxis theory of biology, a kind of stannum fixed abrasive pad with
bionic surface texture has been designed, and the contact mechanism and ANSYS model have been established. By the
calculating and analysis of contact pressure distribution on polishing wafer, the contact pressure distribution and the
effects of the geometrical and physical parameters polishing pad on the contact pressure distributions have been obtained.
The results show that the horizontal effect of the polishing pad is very small, the uniformity of contact pressure
distribution can be improved, and there are the phyllotactic parameters which make the contact pressure distribution
more uniformity.
In order to make the polishing slurry distribution more uniform over the polishing region, a new kind of polishing pad,
which has sunflower seed pattern, has been designed based on the phyllotaxis theory of biology, and the boundary
conditions of polishing slurry flow have been established. By the help of computational fluid dynamics software
(FLUENT), the flow state of the polishing slurry is simulated and the effects of the phyllotactic parameters of polishing
pad on the flow field of polishing slurry are analyzed. The results show that when the polishing slurry is imported from
the center of phyllotaxis polishing pad, the slurry flows along the counterclockwise and clockwise spiral grooves of
phyllotatic pattern, which make fluid flow divergence around, and the flow field becomes more uniform.
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