Dr. Willem van Mierlo
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 9 July 2024 Poster + Paper
Proceedings Volume 12955, 129552S (2024) https://doi.org/10.1117/12.3010445
KEYWORDS: Scanning electron microscopy, Metrology, Photoresist materials, Image quality, Defect inspection, Semiconducting wafers, Bridges, Extreme ultraviolet lithography, Defect detection, Inspection

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 129551Y (2024) https://doi.org/10.1117/12.3006277
KEYWORDS: Line edge roughness, Line width roughness, Semiconducting wafers, Scanning electron microscopy, Distortion, Stochastic processes, Metrology, Bias correction, Error analysis

Proceedings Article | 12 May 2020 Presentation + Paper
Proceedings Volume 11323, 113230U (2020) https://doi.org/10.1117/12.2552067
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Nanoimprint lithography, Extreme ultraviolet lithography, Finite element methods, Optical lithography, Photomasks, Extreme ultraviolet, Stochastic processes, Inspection

Proceedings Article | 26 March 2019 Presentation
Harm Dillen, Dorothe Oorschot, Marleen Kooiman, Willem van Mierlo, Ziyang Wang, Kang-San Lee, Jin-Woo Lee, Ruochong Fei, Shu-Yu Lai, Marc Kea, Inhwan Lee, Hwan Kim, Junghyun Kang, Jaehee Hwang, Chang-Moon Lim
Proceedings Volume 10959, 109591K (2019) https://doi.org/10.1117/12.2515487
KEYWORDS: Failure analysis, Critical dimension metrology, Metrology, Extreme ultraviolet lithography, Printing, Semiconducting wafers

Proceedings Article | 20 March 2018 Paper
Anita Bouma, Bart Smeets, Lei Zhang, Thuy T. Vu, Peter de Loijer, Maikel Goosen, Willem van Mierlo, Wendy Liebregts, Bart Rijpers
Proceedings Volume 10587, 105871G (2018) https://doi.org/10.1117/12.2304364
KEYWORDS: Overlay metrology, Diffraction, Wavefront aberrations, Optical aberrations

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