Dr. Walter D. Gillespie Profile

Dr. Walter D. Gillespie

Senior Scientist at Cymer LLC

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Publications (7)

Proceedings Article | 21 March 2018 Paper

DUV light source sustainability achievements and next steps

Yzzer Roman, Ted Cacouris, Kumar Raja Guvindan Raju, Dinesh Kanawade, Walt Gillespie, Siqi Luo, Eric Mason, David Manley, Saptaparna Das

Proceedings Volume 10587, 1058716 (2018) https://doi.org/10.1117/12.2299387

KEYWORDS: Light sources, Neon, Deep ultraviolet, Carbon, Metals, Semiconducting wafers, Helium, Semiconductors, Nitrogen

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Proceedings Article | 20 June 2017 Paper

Advances in DUV light source sustainability

Yzzer Roman, Dinesh Kanawade, Walt Gillespie, Siqi Luo, Mark Thever, Thomas Duffey, Kevin O'Brien, Rahul Ahlawat, Andrei Dorobantu, Eric Gross, Eric Mason

Proceedings Volume 10147, 101471Y (2017) https://doi.org/10.1117/12.2260307

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Cymer continues to address several areas of sustainability within the semiconductor industry by reducing or eliminating consumption of power and specific types of gas (i.e. neon, helium) required by DUV light sources in order to function. Additionally, Cymer introduced a new recycling technology to reduce the dependence on production of raw gases. In this paper, those initiatives that reduce the operational cost, environmental footprint, and business continuity risk will be discussed.

Cymer has increased the efficiency of its light sources through improvements that have resulted in energy output increase while maintaining the same or requiring less power consumption. For both KrF and ArF systems, there have been component [1], system, and architecture improvements [2] that allowed customers to increase energy efficiency and productivity. An example of module improvements is the latest MO chamber that helped reduce power consumption by ~15%. Future improvements aim to continue reducing the power consumption and cost of operation of the install base and new systems.

The neon supply crisis in 2015 triggered an intensive effort by the lithography light source suppliers to find ways to minimize the use of neon, a main consumable of the light source used in DUV photolithography. Cymer delivered a multi-part support program to reduce natural resource usage, decrease overall cost of operation, and ensure that chipmaker’s business continuity risk is minimized. The methods used to minimize the use of neon for 248 nm and 193 nm photolithography that offered significant relief from supply constraints and reduction of business continuity risk for chipmakers were described in previous work [3]. In this paper, results from the program will be presented.

In addition, techniques to capture the neon effluent and re-purify it within the semiconductor fabs have been pursued. For example, Cymer has developed and validated a neon recycling system for ArF light sources that resides within the chipmaker’s fab. Cymer has partnered with a global gas supplier to develop a system capable of capturing, recycling and delivering <90% of the total neon gas required by multiple ArF light sources through automated operation, including online analysis. In this paper, the neon recycle system performance as demonstrated by a quantitative analysis of facility-supplied gas versus the recycled neon in ArF light source performance will be discussed.

Similarly, DUV light sources have historically used helium as a purge gas in the critical line narrowing module (LNM) to achieve stable wavelength and bandwidth control. Helium has a low coefficient of index of refraction change vs. temperature relative to nitrogen and provides efficient cooling and purging of critical optics in the LNM. Previous work demonstrated how helium consumption can be reduced and still achieve stable performance under all operating conditions [1]. In this paper, results of eliminating the use of helium will be described.

Proceedings Article | 26 March 2015 Paper

Enabling CoO improvement thru green initiatives

Eric Gross, G. Padmabandu, Richard Ujazdowski, Don Haran, Matt Lake, Eric Mason, Walter Gillespie

Proceedings Volume 9426, 942626 (2015) https://doi.org/10.1117/12.2086283

KEYWORDS: Helium, Molybdenum, Nitrogen, Optical lithography, Light sources, Oscillators, Photoacoustic tomography, Field emission displays, Energy efficiency, Manufacturing

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Proceedings Article | 15 March 2006 Paper

XLA-300: the fourth-generation ArF MOPA light source for immersion lithography

Fedor Trintchouk, Toshihiko Ishihara, Walter Gillespie, Richard Ness, Robert Bergstedt, Christian Wittak, Richard Perkins

Proceedings Volume 6154, 615423 (2006) https://doi.org/10.1117/12.658723

KEYWORDS: Light sources, Metrology, Spectroscopy, Scanners, Polarization, Immersion lithography, Acoustics, Manufacturing, Control systems, Pulsed laser operation

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Proceedings Article | 12 May 2005 Paper

XLA-200: the third-generation ArF MOPA light source for immersion lithography

Toshihiko Ishihara, Robert Rafac, Wayne Dunstan, Fedor Trintchouk, Christian Wittak, Richard Perkins, Robert Bergstedt, Walter Gillespie

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600075

KEYWORDS: Gas lasers, Pulsed laser operation, Polarization, Molybdenum, Light sources, Spectroscopy, Immersion lithography, Fluorine, Birefringence, Beam controllers

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Proceedings Article | 12 May 2005 Paper

6 kHz MOPA light source for 193 nm immersion lithography

Walter Gillespie, Toshihiko Ishihara, William Partlo, George Ferguson, Michael Simon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601664

KEYWORDS: Acoustics, Fluctuations and noise, Pulsed laser operation, Control systems, Light sources, Head, Immersion lithography, Electrodes, Pulsed power, Laser stabilization

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Proceedings Article | 28 May 2004 Paper

Long-term reliable operation of a MOPA-based ArF light source for microlithography

Toshihiko Ishihara, Herve Besaucele, Cynthia Maley, Vladimir Fleurov, Patrick O'Keeffe, Mary Haviland, Richard Morton, Walter Gillespie, Timothy Dyer, Bryan Moosman, Robert Poole

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535614

KEYWORDS: Molybdenum, Oscillators, Optical lithography, Calibration, Electrodes, Manufacturing, Optics manufacturing, Light sources, Laser stabilization, Pulsed laser operation

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Showing 5 of 7 publications

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