Venkata Siva R. Battula
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 27 May 2009 Paper
Venkata Siva Battula, Jacob Zeuske, Roxann Engelstad, Pradeep Vukkadala, Andrew Mikkelson, Chris Van Peski
Proceedings Volume 7470, 747014 (2009) https://doi.org/10.1117/12.835202
KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Interferometry, Photography, Computer aided design, Interferometers, Extreme ultraviolet, Beam expanders, Lithography

Proceedings Article | 2 May 2008 Paper
Proceedings Volume 6792, 67920X (2008) https://doi.org/10.1117/12.798937
KEYWORDS: Extreme ultraviolet lithography, Interferometry, Photomasks, Reticles, Data modeling, 3D modeling, Mathematical modeling, Photography, Image quality, Control systems

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 673014 (2007) https://doi.org/10.1117/12.746842
KEYWORDS: Extreme ultraviolet lithography, Reticles, Photomasks, Interferometry, 3D modeling, Standards development, Kinematics, Semiconductors, Lithographic illumination, Mechanics

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