KEYWORDS: Thin films, Holograms, 3D image reconstruction, Etching, Chemical elements, Chalcogenides, Diffractive optical elements, Electron beams, Electron beam lithography, Holography
A focused electron beam was used to interact with the chalcogenide thin film substrate. The result of the interaction is presented as controlled relief formation on the substrate surface after etching in an alkaline amine solution. By managing focused electron beam parameters, diffractive optical elements and hidden image effect by means of digital hologram have been recorded. As a result, reflected laser beam of the thin film substrate in the near field represents the hidden image that has been recorded along the hologram in the background. The possibilities of practical usage of this substrate as the material for the production of holograms and diffractive optical elements are discussed.
In this paper, we demonstrate the approach of obtaining an array of ZnO nanowires, deposited as a thin film on different substrates (glass, Si plate, foil, etc.). As-obtained ZnO thin films have a hydrophilic state with water droplets with a contact angle value of 0°. Treatment of ZnO thin films with H2 gas (under specific conditions) changes the state of ZnO thin films to a hydrophobic state with a roll-off angle with the droplet of water 60°. However, ZnO thin films treatment with O2 gas makes ZnO thin films go back to a hydrophilic state. This operation can be repeated in a cycle manner using H2 and O2 gases to approach different states of ZnO thin films such as hydrophilic and hydrophobic. Thin films of ZnO nanowires can be deposited on a variety of substrates such as glasses, metals, and polyamides.
KEYWORDS: Holograms, Diffraction, 3D image reconstruction, Visualization, Diffraction gratings, Information security, Optical recording, Digital holography, Holography, Scanning electron microscopy
The given work investigates principles of recording, calculation, and security aspects of ‘hidden image’ effect in digital holograms that are intended for security applications. Dot-matrix and image-matrix technologies of optical recording can be widely used for recording protective holograms with such type of security features. When a collimated laser beam falls on and then is reflected from the section of holograms, containing a protective ‘hidden image’ element, a graphic image can be seen in the projection of diffracted light on the frosted screen. The present work also discusses a method of personalizing the ‘hidden image’ effect with the help of laser demetallization. In this way the hidden image can be individualized for each hologram sticker and contain additional information such as a number, text or logotype. The attractiveness of this method is in the possibility of achieving a considerable increase of the protective characteristic of holograms and incorporating additional variable information in them, as well as in providing both visual and automatic ways of checking authenticity of a hologram.
The electron beam (EB) induced changes in solubility of thin As-S-Se films have been studied. Optimal
absorption current choice, nano structure relief and shape dependence on acceleration voltage discussed. The possibilities
of practical use of these materials as resist for gratings and optical diffractive element production using EB. New results
are presented that indicate chalcogenide glasses as promising electron beam resists.
Electron beam (EB) induced changes in thin films of the amorphous chalcogenide semiconductors As-S-Se
have been studied. The experimental results on patterning of As-S-Se film surfaces by EB exposure and following
chemical etching are presented. The possibilities of practical application of this material as resists for the production of
relief holograms and diffractive optical elements (DOE) are discussed.
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