Dr. Tsunehiro Sai Profile

Dr. Tsunehiro Sai

Staff Research Member at Mitsubishi Chemical Corp

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Proceedings Article | 4 December 2008 Paper

Application of multi-tone mask technology in photolithographic fabrication of color filter components in LCD

Yoshihiro Takada, Matoko Fukui, Tsunehiro Sai

Proceedings Volume 7140, 71401T (2008) https://doi.org/10.1117/12.804628

KEYWORDS: Photomasks, Photoresist materials, Transmittance, Picosecond phenomena, LCDs, Deep ultraviolet, Optical lithography, Optical filters, Lithography

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Recent progresses in the photoresists and photolithography for LCD industry applications have been primarily driven by the following two factors: advancement in the material performances (high resolution, high contrast ratio, low dielectric constant) for higher display quality, and cost reduction in the fabrication process. Along with crucial demand for cost competitiveness by improving production efficiency, environmental consciousness has been a major priority at fabrication process design to minimize the amount of waste produced. Having said the above, integration of two or more fabrication processes into a single process by using multi-tone mask technology has been the interest of research, due to its obvious advantage of reducing fabrication processes and cost. For example, multi-tone mask technology application has been widely employed on the TFT side to reduce the different types of photomasks being used. Similar trend has been employed on the CF side as well, where application of multi-tone mask technology is being investigated to integrate fabrication of multiple CF micro-components into a single process. In this presentation, we demonstrate a new approach of fabricating photospacer and peripheral CF components (MVA protrusion, sub-photospacers) in a single integrated process through multi-tone mask technology.

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