Dr. Tomohisa Fujisawa Profile

Dr. Tomohisa Fujisawa

at JSR Engineering Co Ltd

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 6 April 2015 Paper

Novel EUV resist development for sub-14nm half pitch

Masafumi Hori, Takehiko Naruoka, Hisashi Nakagawa, Tomohisa Fujisawa, Takakazu Kimoto, Motohiro Shiratani, Tomoki Nagai, Ramakrishnan Ayothi, Yoshi Hishiro, Kenji Hoshiko, Toru Kimura

Proceedings Volume 9422, 94220P (2015) https://doi.org/10.1117/12.2085927

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Diffusion, Line width roughness, Lithography, Chemically amplified resists, Optical lithography, Chemical species, Semiconductor manufacturing, Semiconductors

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Proceedings Article | 16 April 2011 Paper

Ultra-thin-film EUV resists beyond 20nm lithography

Hiroki Nakagawa, Tomohisa Fujisawa, Kentaro Goto, Tooru Kimura, Toshiyuki Kai, Yoshi Hishiro

Proceedings Volume 7972, 79721I (2011) https://doi.org/10.1117/12.879303

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Etching, Diffusion, Semiconducting wafers, Line width roughness, Photoresist processing, Silica, Optical lithography

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Proceedings Article | 26 March 2010 Paper

Simplified double patterning process with non-topcoat self-freezing resist

Tomohisa Fujisawa, Yusuke Anno, Masafumi Hori, Goji Wakamatsu, Michihiro Mita, Koji Ito, Hiromitsu Tanaka, Kenji Hoshiko, Takeo Shioya, Kentaro Goto, Yoshifumi Ogawa, Hiroaki Takikawa, Yutaka Kozuma, Koichi Fujiwara, Makoto Sugiura, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 7639, 76392Y (2010) https://doi.org/10.1117/12.846493

KEYWORDS: Double patterning technology, Photoresist processing, Lithography, Manufacturing, Optical lithography, Silica, Water, Immersion lithography, Critical dimension metrology, Extreme ultraviolet lithography

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